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Tungsten sputtering target

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China Customized Tungsten Sputtering Material Target with Melting Point of 3422°C for sale

Customized Tungsten Sputtering Material Target with Melting Point of 3422°C

Price: Negotiable
MOQ: Negotiable
Delivery Time: Negotiable
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China Tungsten sputtering target Thermal Conductivity 173 W/mK Round without coating for sale

Tungsten sputtering target Thermal Conductivity 173 W/mK Round without coating

Price: Negotiable
MOQ: Negotiable
Delivery Time: Negotiable
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China Melting Point 3422°C Tungsten Sputter Coating Target for Advanced Coating for sale

Melting Point 3422°C Tungsten Sputter Coating Target for Advanced Coating

Price: Negotiable
MOQ: Negotiable
Delivery Time: Negotiable
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China Customized Tungsten Sputtering Target with Indium Bonding and 7.5 Mohs Hardness for sale

Customized Tungsten Sputtering Target with Indium Bonding and 7.5 Mohs Hardness

Price: Negotiable
MOQ: Negotiable
Delivery Time: Negotiable
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China Customized Tungsten Thin Film Sputter Target with 19.3 G/cm3 Density for sale

Customized Tungsten Thin Film Sputter Target with 19.3 G/cm3 Density

Price: Negotiable
MOQ: Negotiable
Delivery Time: Negotiable
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China Indium Bonding Tungsten Sputtering Target for Thin Film Deposition Ra 0.8 μm for sale

Indium Bonding Tungsten Sputtering Target for Thin Film Deposition Ra 0.8 μm

Price: Negotiable
MOQ: Negotiable
Delivery Time: Negotiable
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China Tungsten Thin Film Deposition Target for Round Substrate Deposition Techniques for sale

Tungsten Thin Film Deposition Target for Round Substrate Deposition Techniques

Price: Negotiable
MOQ: Negotiable
Delivery Time: Negotiable
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China Ra 0.8 μm Tungsten Sputtering Target with Indium Bonding and 173 W/mK Thermal Conductivity for sale

Ra 0.8 μm Tungsten Sputtering Target with Indium Bonding and 173 W/mK Thermal Conductivity

Price: Negotiable
MOQ: Negotiable
Delivery Time: Negotiable
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China Round Tungsten Sputtering Target W 99.95% High Purity High Density Density 19.3 G/cm3 for sale

Round Tungsten Sputtering Target W 99.95% High Purity High Density Density 19.3 G/cm3

Price: Negotiable
MOQ: Negotiable
Delivery Time: Negotiable
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China Melting Point 3422°C Tungsten Sputtering Target for Advanced Thin Film Deposition for sale

Melting Point 3422°C Tungsten Sputtering Target for Advanced Thin Film Deposition

Price: Negotiable
MOQ: Negotiable
Delivery Time: Negotiable
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